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ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

Pages: 10
Publication date: 2019-07-01
Price: 45 vnd

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ISO 21859:2019 specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
Document identifier
ISO 21859:2019
Title
Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
ISO Category
TC 206: Fine ceramics
Publication date
2019-07-01
Status
Effective
International Relationship
BS ISO 21859:2019
Cross references
Latest version
History of version
Keywords
Classification
81.060.30. Advanced ceramics
Pages
10
Price 45 vnd

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