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ISO 14237:2000

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

Pages: 22
Publication date: 2000-02-01
Price: Contact

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This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.
Document identifier
ISO 14237:2000
Title
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO Category
TC 201/SC 6: Secondary ion mass spectrometry
Publication date
2000-02-01
Status
Ineffective
International Relationship
Cross references
Latest version
ISO 14237:2010
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
Document identifier ISO 14237:2010
Publication date 2010-07-15
Classification 71.040.40. Chemical analysis
Status Effective
*
History of version
ISO 14237:2010*ISO 14237:2000 * ISO 14237:2010 * ISO 14237:2000
Keywords
Classification
71.040.40. Chemical analysis
Pages
22
Price Contact

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