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IEC 62047-29 Ed. 1.0 en:2017

Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature

Pages: 12
Publication date: 2017-11-22
Price: 82 vnd

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IEC 62047-29:2017(E) specifies a relaxation test method for measuring electromechanical properties of freestanding conductive thin films for micro-electromechanical systems (MEMS) under controlled strain and room temperature. Freestanding thin films of conductive materials are extensively utilized in MEMS, opto-electronics, and flexible/wearable electronics products. Freestanding thin films in the products experience external and internal stresses which could be relaxed even under room temperature during a period of operation, and this relaxation leads to time-dependent variation of electrical performances of the products. This test method is valid for isotropic, homogeneous, and linearly viscoelastic materials.
Document identifier
IEC 62047-29 Ed. 1.0 en:2017
Title
Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature
IEC Category
SC 47F: Micro-electromechanical systems
Publication date
2017-11-22
Status
Effective
International Relationship
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Keywords
Pages
12
Price 82 vnd